BMF HF Vapor Etcher

SOL #: NB680000-26-01364Sources Sought

Overview

Buyer

Commerce
National Institute Of Standards And Technology
DEPT OF COMMERCE NIST
GAITHERSBURG, MD, 20899, United States

Place of Performance

Boulder, CO

NAICS

Analytical Laboratory Instrument Manufacturing (334516)

PSC

Laboratory Equipment And Supplies (6640)

Set Aside

No set aside specified

Timeline

1
Posted
Apr 29, 2026
2
Response Deadline
May 8, 2026, 8:00 PM

Qualification Details

Fit reasons
  • NAICS alignment with historical contract wins in similar service areas.
  • Scope strongly matches core technical capabilities and delivery model.
Risks
  • Past performance thresholds may require one additional teaming partner.
  • Potential clarification needed on staffing minimums before bid/no-bid.
Next steps

Validate eligibility requirements, assign capture owner, and schedule partner outreach to confirm teaming strategy before submission planning.

Quick Summary

The National Institute of Standards & Technology (NIST) is conducting market research through a Sources Sought notice to identify qualified vendors capable of providing a BMF HF Vapor Etcher for the Boulder Micro-Fabrication Facility (BMF) in Boulder, CO. This system is required to etch substrates up to 150 mm. Capability statements are due by May 8, 2026.

Purpose & Scope

This is a market research tool, not a request for quotation or proposals, to determine potential and eligible business firms. NIST seeks information on vendors that can supply a new Hydrofluoric Acid (HF) vapor etching system. The current system is limited to 100 mm, and the new unit must handle substrates up to 150 mm. The government is also exploring the possibility of a trade-in credit for its existing Idonus VPE 100 system.

Key Requirements

The HF vapor etch unit must:

  • Use liquid HF as a vapor source (not HF gas) and be compatible with approximately 48% HF in water.
  • Be capable of etching substrates from 5x5 mm chips up to 150 mm wafers.
  • Achieve an SiO2 etch rate of 3-30 um/hour and etch uniformity of typically 90% (50% guaranteed with a 3mm exclusion zone).
  • Include substrate heating to 35-60°C.
  • Be designed for safe operation, minimizing user interaction with HF, and ensure substrates are dry and residue-free after etching.
  • Have physical dimensions for the process unit of approximately 25 cm x 40 cm x 25 cm (W x L x H), with control electronics fitting within 30 cm x 30 cm x 10 cm (W x L x H).
  • All items must be new; used, remanufactured, or prototype items are not acceptable.

Submission Requirements

Interested organizations should submit electronic capability statements, limited to four (4) pages or less, to Angela Hitt at angela.hitt@nist.gov. Responses must include:

  1. Name of the company providing the product.
  2. Name of the company manufacturing the product.
  3. Country of origin or manufacture of the product.
  4. Spec/data sheets and examples demonstrating experience in meeting the requirements.
  5. Typical lead time to deliver after receipt of order.
  6. Any other relevant information for developing minimum specifications.

Contract & Timeline

  • Opportunity Type: Sources Sought / Market Research
  • NAICS: 334516 (Analytical Laboratory Instrument Manufacturing, 1,000 employee size standard)
  • Set-Aside: Market research will determine if Small Business Set-aside opportunities exist; all business sizes are encouraged to respond.
  • Response Due: May 8, 2026, 8:00 PM ET
  • Published: April 29, 2026
  • Period of Performance: 1 year After Receipt of Order (ARO)
  • Delivery: F.O.B. Destination to NIST Boulder, CO

Evaluation

Responses will be used to identify potential and eligible firms, including those manufacturing the product in the U.S., and to determine the method of acquisition and potential small business set-aside opportunities.

Additional Notes

This notice is for planning purposes only and does not commit the Government to award a contract. No solicitation is currently available, and no quotes will be accepted at this time. The Government will not pay for information received.

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Sources Sought
Posted: Apr 29, 2026
BMF HF Vapor Etcher | GovScope